NPGS for SEM Lithography & FIB Lithography

Nanometer Pattern Generation System

For Direct Write Lithography using a commercial Electron Beam or Ion Beam Microscope.

The Nanometer Pattern Generation System (NPGS) is the top selling SEM lithography system at research institutions in North America and its use has become widespread around the world. The objective for NPGS is to provide a powerful, versatile, and easy to use system for doing advanced electron beam lithography or ion beam lithography using a commercial SEM (Scanning Electron Microscope), STEM (Scanning Transmission Electron Microscope), FIB (Focused Ion Beam), dual beam (SEM/FIB), or Helium Ion microscope. The success of NPGS at meeting this goal is demonstrated by the strong recommendations from current users.

You are invited to inspect the following links for additional information on NPGS, and you are encouraged to get any additional questions answered about NPGS, electron beam lithography (EBL), Ion Beam Lithography, or microscopes in general, by telephone or e-mail.

To learn more about NPGS and SEM lithography in general, please view the following pages:

Overview
Questions & Answers
System Description
Microscope Considerations
User List - With an interactive user location map
Sample Pictures - Also see the Diagnostic Images
Other Resources & Links
Book List
User Notices - The NPGS v9.2 Upgrade which supports QCAD for pattern design is now available

For additional information, please contact:

Joe Nabity, Ph.D.
JC Nabity Lithography Systems
P.O. Box 5354
Bozeman, MT 59717 USA
(406) 587-0848
info@jcnabity.com
www.jcnabity.com

New links or information added to the NPGS web site:

Direct write Pt patterning with NPGS using EBID

Template Stripped Nanostructures

NPGS: The highest performance / lowest cost direct write Lithography System for over 20 years!

The last update of this site was on June 21, 2024.