NPGS: Bad Coating
![]() The most interesting aspect of this image is that where the lines are close together, the original narrow linewidths of ~50 nm can be still be seen, but farther away the lines appear to become wider. This same effect where isolated lines appear to be wider than closely spaced lines was also apparent in other patterns on the same sample, but this image most dramatically demonstrates the effect. A subsequent sample with an identical exposure and a good coating had uniform lines of ~50 nm throughout the entire pattern, as expected.
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![]() The entire sample showed the systematic effect where closely spaced lines appeared to be reasonably sharp, while more isolated lines appear wide with rounded edges.
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Also see the general SEM Optimization Guide and the SEM Lithography Setup Guide.