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Click the images below to see the full picture and a written summary. (Jump down to Diagnostic Images.)

Many Detailed
Structures
Rose
written in 1989
Hex Grid

45 Degree Box
~30 nm lines
Filled Polygons* Radial Dots*
0.3 um spacing
Lines of 5nm
Au Islands
Isolated Line
~12 nm width
Dense Lines
1:1 Line/Space
~10 nm lines
Dose Matrix
1:1 Line/Space
to ~14 nm
Ice Lithography
to ~9 nm
Air Bridge to
Quantum Dot
Free-Standing
AuPd Film
Melted AuPd
Film
Dammann
Grating

800 x 800 microns
Fine AuPd Wires
~30 nm wide
RAM Device MEMS*
Devices
Free-Standing Al
Structures
Logarithmic
Spirals*
Circular Grating Circular Grating
0.15 um period
Deeply Etched
Optical
Resonator
Crossed Carbon
Nanotubes
from 1999
Double Bend
Point Contact
Split Gate
Structure
Large Bonding
Pads for Split
Gate
Electroplated
SAW Devices
Electron Pump
AFM image
Multilayer
Cu/Co Wire
E-Beam

Deposition.......:

Dartmouth Seal*
Magnetic Loops*
(using cFE SEM)
USA Map
Template
Stripped
Nanostructures
Electron Beam
Induced
Deposition
(EBID)
FIB Milling........:
FIB Milling:
300 nm Dots
FIB Milling:
DaVinci's
Vitruvian Man
FIB Milling:
Escher drawing

Diagnostic Images - A Guide to Common SEM Lithography Exposure Problems:

While the images shown above demonstrate very good results in the wide range of applications that NPGS has been used for, when first learning to do lithography, it can be more important to know the cause of common problems. Consequently, the following images are shown to help new users diagnose common exposure problems. By clicking an image below, you will obtain a discussion of the problem displayed and/or instructions on the recommended approach for doing SEM lithography.

Also see the general SEM Optimization Guide and the SEM Lithography Setup Guide.


Gold Standard * Contamination
Spots
Charging #1
during imaging
Charging #2
during writing
Lift-Off* Line Frequency
Noise
Wheel #1
~20 nm lines
Wheel #2* Wheel #3* Wheel #4
AFM Image
Wheel #5
AFM Image
Wheel #6
Bad
Magnification
Bad Coating
Small Dots
10 kV Wheel
Negative PMMA
Double
Exposure


* Image was acquired using the NPGS Digital Imaging Feature.
All images on this site are Copyright (c) by JC Nabity Lithography Systems unless otherwise noted. Permission to display these images for non-commercial uses will be given if a request is made in writing before such use and if proper reference to JC Nabity Lithography Systems is displayed with the image(s).
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