NPGS: Deep Etch
This image shows a deeply etched optical resonator. The device is made of
InP/InGaAsP waveguide material etched to a depth of 2.5 microns. The pattern
was written in PMMA, and was then transferred in SiO2 which was subsequently
used as etch mask in CAIBE. This work was done by Dr. Yan Feng at the Institute
for Microstructural Sciences, National Research Council of Canada.