NPGS  : Detailed Structures

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These structures were written in a single layer of PMMA using a 5 pA beam at 40 kV. The finest linewidths are ~30 nm. The SEM picture was taken after the sample was developed and coated with gold for viewing. The roughness in the picture is an artifact of the scanning process used to digitize the image. See the Rose, Hex Grid, and 45 Degree Box images for clearer views at higher magnifications.
Copyright (c) 1996 JC Nabity Lithography Systems. All rights reserved.