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image shows very fine lines defined by ~5 nm diameter islands of Au. The
lines were fabricated by first exposing and developing 150 nm thick PMMA
to produce ~5 nm wide lines. Then a granular Au film was intentionally deposited
such that only one Au island formed across the width of each line and liftoff
produced the results seen in the image. This work was done by Christophe
Vieu, Franck Carcenac and Huguette Launois at L2M/CNRS-France (Microstructures
and Microelectronique Laboratory) using a 200 kV TEM/STEM. Note that the
high accelerating voltage was essential in producing such fine structures.
For more information, see "From Nano- to Macroscale Science and Technology",
Condensed Matter News - Vol 6, Issue 3-4, p22-30, (1998).