NPGS : 20 nm Pitch (with ~10 nm lines)
This picture shows an SEM image of a linear grating with ~10 nm
lines and a pitch of ~20 nm. The exposure was in ~30nm thick PMMA on a Si
substrate where a relatively high dose was used to
crosslink the PMMA, rather than using the PMMA
as a conventional positive resist. After development, the sample was sputter
coated with ~1nm of AuPd.
This work was done at the Optoelectronics Research Centre at the University of Southampton, UK.
Image Copyright © 2012, Optoelectronics Research Centre. Used by permission.